DISLOCATIONS, FACET REGIONS AND GROWTH STRIATIONS IN GARNET SUBSTRATES AND LAYERS

被引:29
作者
STACY, WT [1 ]
机构
[1] PHILIPS RES LABS,EINDHOVEN,NETHERLANDS
关键词
D O I
10.1016/0022-0248(74)90291-7
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:137 / 143
页数:7
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