CHARACTERIZATION OF REACTIVE ION ETCHING OF GLASS AND ITS APPLICATIONS IN INTEGRATED-OPTICS

被引:39
作者
RONGGUI, S [1 ]
RIGHINI, GC [1 ]
机构
[1] CNR,IST RIC ONDE ELETTEOMAGNET,I-50127 FLORENCE,ITALY
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 05期
关键词
D O I
10.1116/1.577229
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report characterization of reactive ion etching (RIE) of soda-lime glass under various conditions. Etching rates of glass and photoresist have been measured while using three different reactive gas mixtures, i.e., CHF3/Ar, CF4/O2, and CF4/Ar. Experimental results are presented referring to the RIE fabrication of periodic structures in soda-lime glass ion-exchanged waveguide, starting from gratings which had been recorded in photoresist by holographic techniques.
引用
收藏
页码:2709 / 2712
页数:4
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