A MODEL OF ENERGY DEPOSITION INTO SEMICONDUCTORS DURING LASER ANNEALING

被引：4

作者：

GEILER, HD

HEHL, K

STOCK, D

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1982年 / 73卷 / 01期

关键词：

D O I：

10.1002/pssa.2210730148

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：K57 / K62

页数：6

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[9] OPTICAL HEATING IN SEMICONDUCTORS [J].

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