LASER-LIGHT ABSORPTION IN MULTILAYERS

被引：16

作者：

COLINGE, JP

VANDEWIELE, F

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 07期

关键词：

D O I：

10.1063/1.329314

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4769 / 4771

页数：3

共 15 条

[1]

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[4]

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IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (01) :290-293

[6] CRYSTAL-STRUCTURE AND THERMAL-OXIDATION OF LASER-RECRYSTALIZED POLYCRYSTALLINE SILICON [J].

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LEE, KF ;

GIBBONS, JF .

APPLIED PHYSICS LETTERS, 1980, 36 (07) :550-553

[7]

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[8]

LAM HW, 1980, DEC IEDM M WASH, P559

[9] REFRACTORY SILICIDES OF TITANIUM AND TANTALUM FOR LOW-RESISTIVITY GATES AND INTERCONNECTS [J].

MURARKA, SP ;

FRASER, DB ;

SINHA, AK ;

LEVINSTEIN, HJ .

IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) :1409-1417

[10] ELECTRICAL-PROPERTIES OF CW LASER-ANNEALED ION-IMPLANTED POLYCRYSTALLINE SILICON [J].

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AFFOLTER, K .

APPLIED PHYSICS LETTERS, 1980, 37 (08) :737-739

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