KINETICS OF FILM GROWTH OF EPITAXIAL GE ON GE AND GAAS BY VAPOR-PHASE TRANSPORT

被引:3
作者
ETIENNE, D
BOUGNOT, G
机构
关键词
D O I
10.1016/0022-0248(84)90361-0
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
引用
收藏
页码:499 / 508
页数:10
相关论文
共 17 条
[1]   EPITAXIAL GROWTH OF MIRROR SMOOTH GE ON GAAS AND GE BY LOW TEMPERATURE GEL2 DISPROPORTIONATION REACTION [J].
BERKENBL.M ;
REISMAN, A ;
LIGHT, TB .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (09) :966-&
[2]   ELECTRICAL PROPERTIES OF N-TYPE GERMANIUM [J].
DEBYE, PP ;
CONWELL, EM .
PHYSICAL REVIEW, 1954, 93 (04) :693-706
[3]  
HURLE DTJ, 1967, J PHYS CHEM SOLIDS S, V1, P241
[4]  
KOLESNIKOV VN, 1979, SOVIET PHYS CRYST, V12, P975
[5]  
LEHIR JF, 1966, THESIS CNET PARIS
[6]   GASEOUS EQUILIBRIA IN THE GERMANIUM IODINE SYSTEM [J].
LEVER, RF .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (07) :775-779
[7]  
LEVER RF, 1964, IBM J, P460
[8]   The free energy of iodine and hydrogen iodide from spectroscopic data [J].
Murphy, GM .
JOURNAL OF CHEMICAL PHYSICS, 1936, 4 (06) :344-350
[9]  
NAMORDI MR, 1979, IEEE T ELECTRON DEV, V26, P1074, DOI 10.1109/T-ED.1979.19548
[10]  
PASCAL P, 1961, NOUVEAU TRAITE CHIMI, V16, P458