MEASUREMENT TECHNIQUES FOR SUB-MICRON RESIST IMAGES

被引:5
作者
ROSENFIELD, MG
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期
关键词
D O I
10.1116/1.584138
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1944 / 1949
页数:6
相关论文
共 19 条
[1]   ELECTRON-BEAM METROLOGY AND INSPECTION. [J].
Brunner, Matthias ;
Schmid, R. .
Microelectronic Engineering, 1987, 7 (01) :41-60
[2]  
HALAVEE U, 1988, P SPIE, V921
[3]  
JOY DC, 1988, SCANNING MICROSCOPY, V2, P57
[4]  
Larrabee R. D., 1987, Proceedings of the SPIE - The International Society for Optical Engineering, V775, P46, DOI 10.1117/12.940410
[5]   AUTOMATIC ELECTRON-BEAM METROLOGY SYSTEM FOR DEVELOPMENT OF VERY LARGE-SCALE INTEGRATED DEVICES [J].
MATSUOKA, G ;
ICHIHASI, M ;
MURAKOSHI, H ;
YAMAMOTO, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01) :79-83
[6]  
MONAHAN KM, 1988, P SPIE, V921
[7]  
MONAHAN KM, 1987, P SPIE, V775
[8]  
MONAHAN KM, 1987, SOLID STATE TECH SEP, P141
[9]  
NYSSONEN D, COMMUNICATION
[10]  
NYSSONEN D, IN PRESS P SPIE, V921