ANODIC DISSOLUTION OF SILICON IN HYDROFLUORIC ACID SOLUTIONS

[1] BECK F, 1959, Z ELEKTROCHEM, V63, P500

[2] INVESTIGATION OF CHEMICAL PROPERTIES OF STAIN FILMS ON SILICON BY MEANS OF INFRARED SPECTROSCOPY [J]. SURFACE SCIENCE, 1965, 3 (04) : 314 - &

[3] SATURATION CURRENTS IN GERMANIUM AND SILICON ELECTRODES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (12) : 715 - 718

[4] HARTEN HU, 1964, PHILIPS TECHNISCHE R, V10, P377

[5] FORMATION OF HYDRIDE FILMS ON TI, ZR, HF, TH DISSOLVING IN HYDROFLUORIC ACID [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1959, 106 (07) : 631 - 632

[6] Levich B, 1942, ACTA PHYSICOCHIM URS, V17, P257

[7] Levich B. G., 1962, PHYSICOCHEMICAL HYDR

[8] MEMMING R, TO BE PUBLISHED

[9] ON THE MECHANISM OF CHEMICALLY ETCHING GERMANIUM AND SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (10) : 810 - 816

[10] ELECTROPOLISHING SILICON IN HYDROFLUORIC ACID SOLUTIONS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (07) : 402 - 408

[1] BECK F, 1959, Z ELEKTROCHEM, V63, P500

[2] INVESTIGATION OF CHEMICAL PROPERTIES OF STAIN FILMS ON SILICON BY MEANS OF INFRARED SPECTROSCOPY [J]. SURFACE SCIENCE, 1965, 3 (04) : 314 - &

[3] SATURATION CURRENTS IN GERMANIUM AND SILICON ELECTRODES [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (12) : 715 - 718

[4] HARTEN HU, 1964, PHILIPS TECHNISCHE R, V10, P377

[5] FORMATION OF HYDRIDE FILMS ON TI, ZR, HF, TH DISSOLVING IN HYDROFLUORIC ACID [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1959, 106 (07) : 631 - 632

[6] Levich B, 1942, ACTA PHYSICOCHIM URS, V17, P257

[7] Levich B. G., 1962, PHYSICOCHEMICAL HYDR

[8] MEMMING R, TO BE PUBLISHED

[9] ON THE MECHANISM OF CHEMICALLY ETCHING GERMANIUM AND SILICON [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1960, 107 (10) : 810 - 816

[10] ELECTROPOLISHING SILICON IN HYDROFLUORIC ACID SOLUTIONS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1958, 105 (07) : 402 - 408