EPITAXIAL-GROWTH OF THIN-FILMS STUDIED BY MOLECULAR-DYNAMICS SIMULATION

被引:9
作者
SCHNEIDER, M
RAHMAN, A
SCHULLER, IK
机构
[1] ARGONNE NATL LAB, DIV MAT SCI, ARGONNE, IL 60439 USA
[2] UNIV MINNESOTA, SCH PHYS & ASTRON, INST SUPERCOMP, MINNEAPOLIS, MN 55455 USA
[3] UNIV CALIF SAN DIEGO, DEPT PHYS B-019, LA JOLLA, CA 92093 USA
基金
美国国家科学基金会;
关键词
D O I
10.1016/0749-6036(90)90112-K
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The epitaxial growth of atomic systems, interacting via the spherically symmetric Lennard-Jones potential is studied as a function of substrate temperature TS and deposition rate. The calculations reveal the microscopic structure of thin films, and give insight into the dynamics of the adsorption process. For all substrate temperatures the growth is into well ordered layers which become fully completed at intermediate TS. At very low TS the layers contain defects and voids; however, the atoms are still arranged in close-packed islands within the layers. It is shown that the films exhibit a pronounced columnar structure if deposited at low TS. © 1990.
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页码:39 / 46
页数:8
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