ELECTRON-STIMULATED DESORPTION FROM CAF2 - PENETRATION DEPTH OF ELECTRONS AND SAMPLE CHARGING

被引:13
作者
BENNEWITZ, R
SMITH, D
REICHLING, M
MATTHIAS, E
ITOH, N
机构
[1] FREE UNIV BERLIN,FACHBEREICH PHYS,D-14195 BERLIN,GERMANY
[2] NAGOYA UNIV,DEPT PHYS,CHIKUSA KU,NAGOYA,AICHI 46401,JAPAN
[3] WAKE FOREST UNIV,DEPT PHYS,WINSTON SALEM,NC 27109
关键词
D O I
10.1016/0168-583X(95)00298-7
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Two aspects of electron stimulated desorption experiments are covered in this contribution, namely the energy deposition of low energy electrons in CaF2 and the charging of the surface during irradiation. The stopping power for electron energies in the range from 50 eV to 5 keV is calculated using optical absorption data. Energy deposition curves and penetration depth vs. electron energy curves are given based on stopping power values and a Monte Carlo simulation of elastic scattering. Charging of the surface is described by means of an equilibrium between primary and secondary electrons. The sensitivity of the surface charging to stoichiometric changes is shown by monitoring the kinetic energy of desorbing F+ ions during metallization of the surface.
引用
收藏
页码:118 / 121
页数:4
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