SILICON SURFACES - METALLIC CHARACTER, OXIDATION AND ADHESION

被引：37

作者：

CROS, A ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL DE PHYSIQUE | 1983年 / 44卷 / 06期

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D O I：

10.1051/jphys:01983004406070700

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学科分类号：

摘要：

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页码：707 / 711

页数：5

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