THE ADSORPTION AND DECOMPOSITION OF MOLYBDENUM HEXACARBONYL ON MO AND SI SURFACES

[1] BURWELL RL, 1984, CATALYSIS ENERGY SCE, P45

[2] CHO CC, 1987, THESIS PRINCETON U

[3] DEPOSITION OF POLYCRYSTALLINE AND AMORPHOUS-SILICON BY INFRARED-LASER IRRADIATION OF SILANE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 670 - 672

[4] PHOTODECOMPOSITION OF MO(CO)6 ADSORBED ON SI(100) [J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (02) : 410 - 414

[5] EFFICIENT MULTI-PHOTON IONIZATION OF METAL-CARBONYLS COOLED IN A PULSED SUPERSONIC BEAM [J]. CHEMICAL PHYSICS, 1979, 44 (03) : 415 - 419

[6] EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P969, DOI 10.1116/1.582718

[7] STUDIES OF ADSORPTION AND ELECTRON-INDUCED DISSOCIATION OF FE(CO)5 ON SI(100) [J]. SURFACE SCIENCE, 1986, 171 (01) : 197 - 207

[8] PHOTOELECTRON-SPECTRA OF TRANSITION-METAL CARBONYL-COMPLEXES - COMPARISON WITH SPECTRA OF ADSORBED CO [J]. PHYSICAL REVIEW B, 1978, 18 (04) : 1673 - 1701

[9] REFRACTORY-METAL GATE PROCESSES FOR VLSI APPLICATIONS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 631 - 640

[10] LASER PHOTODEPOSITION OF REFRACTORY-METALS [J]. APPLIED PHYSICS LETTERS, 1981, 38 (07) : 572 - 574

[1] BURWELL RL, 1984, CATALYSIS ENERGY SCE, P45

[2] CHO CC, 1987, THESIS PRINCETON U

[3] DEPOSITION OF POLYCRYSTALLINE AND AMORPHOUS-SILICON BY INFRARED-LASER IRRADIATION OF SILANE [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 670 - 672

[4] PHOTODECOMPOSITION OF MO(CO)6 ADSORBED ON SI(100) [J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (02) : 410 - 414

[5] EFFICIENT MULTI-PHOTON IONIZATION OF METAL-CARBONYLS COOLED IN A PULSED SUPERSONIC BEAM [J]. CHEMICAL PHYSICS, 1979, 44 (03) : 415 - 419

[6] EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P969, DOI 10.1116/1.582718

[7] STUDIES OF ADSORPTION AND ELECTRON-INDUCED DISSOCIATION OF FE(CO)5 ON SI(100) [J]. SURFACE SCIENCE, 1986, 171 (01) : 197 - 207

[8] PHOTOELECTRON-SPECTRA OF TRANSITION-METAL CARBONYL-COMPLEXES - COMPARISON WITH SPECTRA OF ADSORBED CO [J]. PHYSICAL REVIEW B, 1978, 18 (04) : 1673 - 1701

[9] REFRACTORY-METAL GATE PROCESSES FOR VLSI APPLICATIONS [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 631 - 640

[10] LASER PHOTODEPOSITION OF REFRACTORY-METALS [J]. APPLIED PHYSICS LETTERS, 1981, 38 (07) : 572 - 574