DEPOSITION OF POLYCRYSTALLINE AND AMORPHOUS-SILICON BY INFRARED-LASER IRRADIATION OF SILANE

被引:19
作者
TONNEAU, D
AUVERT, G
PAULEAU, Y
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 03期
关键词
D O I
10.1116/1.573829
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
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页码:670 / 672
页数:3
相关论文
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    [J]. APPLIED PHYSICS LETTERS, 1979, 35 (08) : 626 - 627
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