DEPOSITION OF POLYCRYSTALLINE AND AMORPHOUS-SILICON BY INFRARED-LASER IRRADIATION OF SILANE

[1] BILENCHI R, 1984, P SOC PHOTO-OPT INST, V459, P61, DOI 10.1117/12.939436

[2] CHEMICAL VAPOR-DEPOSITION OF SILICON USING A CO2-LASER [J]. APPLIED PHYSICS LETTERS, 1978, 32 (04) : 254 - 256

[3] LASER-INDUCED VAPOR-DEPOSITION OF SILICON [J]. APPLIED PHYSICS LETTERS, 1979, 35 (08) : 626 - 627

[4] MEUNIER M, 1984, MATER RES SOC S P, V29, P397

[5] PAULEAU Y, 1984, P MATERIALS RES SOC, V29, P41

[6] PAULEAU Y, 1984, LASER PROCESSING DIA, P215

[7] TONNEAU D, 1985, P EUROPEAN C MAT RES, V4, P125

[1] BILENCHI R, 1984, P SOC PHOTO-OPT INST, V459, P61, DOI 10.1117/12.939436

[2] CHEMICAL VAPOR-DEPOSITION OF SILICON USING A CO2-LASER [J]. APPLIED PHYSICS LETTERS, 1978, 32 (04) : 254 - 256

[3] LASER-INDUCED VAPOR-DEPOSITION OF SILICON [J]. APPLIED PHYSICS LETTERS, 1979, 35 (08) : 626 - 627

[4] MEUNIER M, 1984, MATER RES SOC S P, V29, P397

[5] PAULEAU Y, 1984, P MATERIALS RES SOC, V29, P41

[6] PAULEAU Y, 1984, LASER PROCESSING DIA, P215

[7] TONNEAU D, 1985, P EUROPEAN C MAT RES, V4, P125