A QUALITATIVE AND QUANTITATIVE STUDY OF THE OXIDES OF ALUMINUM AND SILICON USING AES AND XPS

被引：39

作者：

KOVACICH, JA ^{[1
]}

LICHTMAN, D ^{[1
]}

机构：

[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201

来源：

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1985年 / 35卷 / 1-2期

关键词：

D O I：

10.1016/0368-2048(85)80038-4

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

引用

页码：7 / 18

页数：12

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