EVAPORATION AND RIPPLE FORMATION DURING PULSED LASER IRRADIATION OF GAAS

被引:3
作者
BOERMA, DO
HASPER, H
PRASAD, KG
机构
关键词
D O I
10.1016/0375-9601(83)90810-1
中图分类号
O4 [物理学];
学科分类号
0702 ;
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页码:253 / 256
页数:4
相关论文
共 19 条
[1]   TIME-RESOLVED TRANSMISSION OF GAAS UNDER INTENSE LASER EXCITATION [J].
AYDINLI, A ;
COMPAAN, A ;
LO, HW ;
LEE, MC .
PHYSICS LETTERS A, 1981, 86 (03) :199-202
[2]   AN EXPERIMENTAL TEST OF GAAS DECOMPOSITION DUE TO PULSED LASER IRRADIATION [J].
DEJONG, T ;
WANG, ZL ;
SARIS, FW .
PHYSICS LETTERS A, 1982, 90 (03) :147-149
[3]   LASER GENERATION OF HIGH-AMPLITUDE STRESS WAVES IN MATERIALS [J].
FAIRAND, BP ;
CLAUER, AH .
JOURNAL OF APPLIED PHYSICS, 1979, 50 (03) :1497-1502
[4]   SURFACE RIPPLES ON SILICON AND GALLIUM-ARSENIDE UNDER PICOSECOND LASER ILLUMINATION [J].
FAUCHET, PM ;
SIEGMAN, AE .
APPLIED PHYSICS LETTERS, 1982, 40 (09) :824-826
[5]  
FLETCHER J, 1981, P MRS S DEFECTS SEMI, P431
[6]  
GAMO K, 1979, LASER SOLID INTERACT, P591
[7]  
GIBBONS JF, 1981, P MRS S LASER ELECTR
[8]   SYNCHROTRON X-RAY-DIFFRACTION STUDY OF SILICON DURING PULSED-LASER ANNEALING [J].
LARSON, BC ;
WHITE, CW ;
NOGGLE, TS ;
MILLS, D .
PHYSICAL REVIEW LETTERS, 1982, 48 (05) :337-340
[9]   ORIGIN OF PERIODIC SURFACE-STRUCTURE OF LASER-ANNEALED SEMICONDUCTORS [J].
MARACAS, GN ;
HARRIS, GL ;
LEE, CA ;
MCFARLANE, RA .
APPLIED PHYSICS LETTERS, 1978, 33 (05) :453-455
[10]  
NAYARAN J, 1981, P MRS S DEFECTS SEMI