A STUDY OF THE INITIAL GROWTH-KINETICS OF THE COPPER-ALUMINUM THIN-FILM INTERFACE REACTION BY INSITU X-RAY-DIFFRACTION AND RUTHERFORD BACKSCATTERING ANALYSIS

被引：39

作者：

HAMM, RA

VANDENBERG, JM

机构：

来源：

关键词：

D O I：

10.1063/1.333960

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：293 / 299

页数：7

共 18 条

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[4]

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[5]

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