APPLICATION OF A FOCUSED ION-BEAM SYSTEM TO DEFECT REPAIR OF VLSI MASKS

被引:44
作者
HEARD, PJ
CLEAVER, JRA
AHMED, H
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期
关键词
D O I
10.1116/1.583297
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
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页码:87 / 90
页数:4
相关论文
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