APPLICATION OF A FOCUSED ION-BEAM SYSTEM TO DEFECT REPAIR OF VLSI MASKS

被引：44

作者：

HEARD, PJ

CLEAVER, JRA

AHMED, H

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期

关键词：

D O I：

10.1116/1.583297

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：87 / 90

页数：4

共 7 条

[1] [Anonymous], 1963, KGL DANSKE VIDENSKAB
[2] A 100-KV ION PROBE MICROFABRICATION SYSTEM WITH A TETRODE GUN
CLEAVER, JRA
AHMED, H
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04): : 1145 - 1148
[3] CLEAVER JRA, 1983, SPIE J, V393, P129
[4] CLEAVER JRA, 1983, MICROCIRCUIT ENG 83, P135
[5] LIQUID-METAL SOURCE OF GOLD IONS
PREWETT, PD
JEFFERIES, DK
COCKHILL, TD
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1981, 52 (04) : 562 - 566
[6] HIGH-RESOLUTION, ION-BEAM PROCESSES FOR MICROSTRUCTURE FABRICATION
SELIGER, RL
KUBENA, RL
OLNEY, RD
WARD, JW
WANG, V
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1610 - 1612
[7] WAGNER A, 1983, SPIE J, V393, P167