AUGER AND PHOTOELECTRON CONTRIBUTIONS TO THE ELECTRON-YIELD SURFACE EXTENDED X-RAY-ABSORPTION FINE-STRUCTURE SIGNAL

被引：72

作者：

STOHR, J

NOGUERA, C

KENDELEWICZ, T

机构：

[1] UNIV PARIS 11,CTR ORSAY,PHYS SOLIDE LAB,F-91405 ORSAY,FRANCE

[2] STANFORD UNIV,STANFORD ELECTR LABS,STANFORD,CA 94305

[3] STANFORD SYNCHROTRON RADIAT LAB,STANFORD,CA 94305

来源：

PHYSICAL REVIEW B | 1984年 / 30卷 / 10期

关键词：

D O I：

10.1103/PhysRevB.30.5571

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：5571 / 5579

页数：9

共 52 条

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PHYSICAL REVIEW B, 1983, 28 (04) :2299-2301

[9] STRUCTURE AND NUCLEATION MECHANISM OF NICKEL SILICIDE ON SI(111) DERIVED FROM SURFACE EXTENDED-X-RAY-ABSORPTION FINE-STRUCTURE [J].

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[10] ELASTIC AND INELASTIC CONTRIBUTIONS TO AUGER-ELECTRON APPEARANCE POTENTIAL SPECTRUM OF TITANIUM [J].

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