LASER-ENHANCED GAS-SURFACE CHEMISTRY - BASIC PROCESSES AND APPLICATIONS

被引：93

作者：

CHUANG, TJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 03期

关键词：

D O I：

10.1116/1.571827

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：798 / 806

页数：9

共 64 条

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