PYROLYTIC DEPOSITION OF CARBON-FILMS CONTAINING NITROGEN AND OR BORON

被引：71

作者：

MAYA, L ^{[1
]}

HARRIS, LA ^{[1
]}

机构：

[1] OAK RIDGE NATL LAB,DIV MET & CERAM,OAK RIDGE,TN 37831

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1990年 / 73卷 / 07期

关键词：

boron; carbon; deposition; films; nitrogen;

D O I：

10.1111/j.1151-2916.1990.tb05244.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Carbon films containing nitrogen and/or boron were prepared in a closed system by the pyrolysis of appropriate precursor materials. The decomposition products of the pyrolysis were identified and the resulting films were characterized by chemical and physical means. The electrical conductivity of the heteroatom‐containing films is similar to that of pure amorphous carbon films. Boron nitride was present in the C‐N‐B film as revealed by XPS and IR spectroscopy. Oxygen appeared to have a role in the adherence of the films to the silica substrate. Copyright © 1990, Wiley Blackwell. All rights reserved

引用

页码：1912 / 1916

页数：5

共 15 条

[1]

ANGUS JC, 1986, CARBON THIN FILMS, P90

[2]

BENYBASSEZ C, 1985, SCANNING ELECTRON MI, V1, P119

[3]

HAMILTON EM, 1974, AMORPHOUS LIQUID SEM, P1225

[4] Core-Electron Binding Energies for Compounds of Boron, Carbon, and Chromium [J].