STRUCTURAL MODEL OF RAMAN DEFECT BANDS OF VITREOUS SILICA

被引：29

作者：

PHILLIPS, JC

机构：

来源：

PHYSICAL REVIEW B | 1987年 / 35卷 / 12期

关键词：

D O I：

10.1103/PhysRevB.35.6409

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：6409 / 6413

页数：5

共 42 条

[1] RAMAN DEFECT PEAKS IN THE SPECTRA OF NA2O SILICA-GELS EVOLVING TOWARD GLASS [J].

BERTOLUZZA, A ;

FAGNANO, C ;

MORELLI, MA ;

GOTTARDI, V ;

GUGLIELMI, M .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 1986, 82 (1-3) :127-136

[2] STRUCTURE OF ULTRATHIN SILICON DIOXIDE FILMS [J].

BOYD, IW ;

WILSON, JIB .

APPLIED PHYSICS LETTERS, 1987, 50 (06) :320-322

[3]

BRINKER CJ, 1986, MATER RES SOC S P, V61, P387

[4] A POSSIBLE RING STRUCTURE IN VITREOUS SILICA [J].

DEAN, P .

NATURE, 1966, 210 (5033) :257-&

[5] VIBRATIONAL-SPECTRA OF RINGS IN VITREOUS SILICA [J].

DELEEUW, SW ;

HE, H ;

THORPE, MF .

SOLID STATE COMMUNICATIONS, 1985, 56 (04) :343-346

[6] VIBRATIONAL NORMAL MODES OF SIO2 .1. ALPHA AND BETA QUARTZ [J].

ETCHEPARE, J ;

MERIAN, M ;

SMETANKINE, L .

JOURNAL OF CHEMICAL PHYSICS, 1974, 60 (05) :1873-1876

[7] VIBRATIONAL NORMAL MODES OF SIO2 .2. CRISTOBALITE AND TRIDYMITE [J].

ETCHEPARE, J ;

MERIAN, M ;

KAPLAN, P .

JOURNAL OF CHEMICAL PHYSICS, 1978, 68 (04) :1531-1537

[8] VLSI TECHNOLOGY AND DIELECTRIC FILM SCIENCE [J].

FEIGL, FJ .

PHYSICS TODAY, 1986, 39 (10) :47-54

[9] FUNDAMENTAL DEFECT CENTERS IN GLASS - PEROXY RADICAL IN IRRADIATED, HIGH-PURITY, FUSED-SILICA [J].

FRIEBELE, EJ ;

GRISCOM, DL ;

STAPELBROEK, M ;

WEEKS, RA .

PHYSICAL REVIEW LETTERS, 1979, 42 (20) :1346-1349

[10]

FUOSS PH, 1987, B AM PHYS SOC, V32, P453

← 1 2 3 4 5 →