STRUCTURAL CONSEQUENCES OF ION ASSISTED DEPOSITION

被引:10
作者
PULKER, HK
LARDON, M
BUHL, R
MOLL, E
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1986年 / 4卷 / 06期
关键词
D O I
10.1116/1.573661
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:2922 / 2924
页数:3
相关论文
共 22 条
  • [1] BERGER R, 1983, P SOC PHOTO-OPT INST, V401, P69, DOI 10.1117/12.935504
  • [2] SYNTHESIS AND CHARACTERIZATION OF YTTRIUM-OXIDE (Y2O3) DEPOSITS
    COLEN, M
    BUNSHAH, RF
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1976, 13 (01): : 536 - 539
  • [3] HOFFMAN RW, 1971, AEC76 CAS W RES U TE
  • [4] HOFFMAN RW, 1961, AEC18 CAS W RES U TE
  • [5] HOFFMAN RW, 1975, AEC82 CAS W RES U TE
  • [6] HOFFMAN RW, 1972, AEC79 CAS W RES U TE
  • [7] HOFFMAN RW, 1975, AEC83 CAS W RES U TE
  • [8] HOFFMAN RW, 1970, AEC64 CAS W RES U TE
  • [9] MORPHOLOGY OF ION-PLATED TITANIUM AND ALUMINUM FILMS DEPOSITED AT VARIOUS SUBSTRATE TEMPERATURES
    LARDON, M
    BUHL, R
    SIGNER, H
    PULKER, HK
    MOLL, E
    [J]. THIN SOLID FILMS, 1978, 54 (03) : 317 - 322
  • [10] ION-ASSISTED DEPOSITION OF OPTICAL THIN-FILMS - LOW-ENERGY VS HIGH-ENERGY BOMBARDMENT
    MCNEIL, JR
    BARRON, AC
    WILSON, SR
    HERRMANN, WC
    [J]. APPLIED OPTICS, 1984, 23 (04): : 552 - 559