MICROFABRICATION OF COMPLEX SURFACE TOPOGRAPHIES USING GREY-TONE LITHOGRAPHY

被引：66

作者：

WAGNER, B ^{[1
]}

QUENZER, HJ ^{[1
]}

HENKE, W ^{[1
]}

HOPPE, W ^{[1
]}

PILZ, W ^{[1
]}

机构：

[1] SIGMA C GMBH,D-85521 OTTOBRUNN,GERMANY

来源：

SENSORS AND ACTUATORS A-PHYSICAL | 1995年 / 46卷 / 1-3期

关键词：

MICROFABRICATION; SURFACE TOPOGRAPHY; LITHOGRAPHY;

D O I：

10.1016/0924-4247(94)00868-I

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper reports on a study of a methodology for fabrication of relief shaped microstructures using technologies common to standard IC manufacturing processes. Particular emphasis is put on the design and use of halftone transmission masks for the lithography step required in the fabrication process of mechanical, optical or electronic components. The design and experimental investigation of grey-tone masks is supported by lithography simulation. Results are presented for both, simulated grey-tone patterns as well as experimental profiles.

引用

页码：89 / 94

页数：6

共 9 条

[1]

DOLDISSEN W, 1993, APR P EUR C INT OPT, P4

[2]

GAL G, 1993, 1993 P DIFFR MIN CR, V49, P329

[3]

Goodman J., 2005, INTRO FOURIER OPTICS

[4]

Henke W., 1994, Proceedings IEEE Micro Electro Mechanical Systems. An Investigation of Micro Structures, Sensors, Actuators, Machines and Robotic Systems (Cat. No.94CH3404-1), P205, DOI 10.1109/MEMSYS.1994.555624

[5]

HENKE W, 1990, MICROELECTRON ENG, V1, P629

[6]

HISANAGA M, 1993, MICRO ELECTRO MECHANICAL SYSTEMS, PROCEEDINGS, P30

[7]

KOKUBO T, 1988, SPIE, V920, P355

[8] ONE-STEP 3D SHAPING USING A GRAY-TONE MASK FOR OPTICAL AND MICROELECTRONIC APPLICATIONS [J].