X-RAY-LITHOGRAPHY, WHERE IT IS NOW, AND WHERE IT IS GOING

被引：23

作者：

MALDONADO, JR

机构：

[1] IBM General Technology Division (GTD), Hopewell Junction, 12533, N.Y.

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1990年 / 19卷 / 07期

关键词：

X-ray lithography review; x-ray lithography systems;

D O I：

10.1007/BF02655238

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

This paper describes the x-ray lithography (XRL) systems presently developed, including the present state of source, resist, mask technology, and exposure tools. Future directions in mask substrate materials, and alternative x-ray sources will be presented. © 1990 The Mineral, Metal & Materials Society, Inc.

引用

页码：699 / 709

页数：11