共 6 条
- [1] AOSHIMA S, 1974, JPN J APPL PHYS, P253
- [2] DAVIS WD, 1975, PHYS REV, V131, P943
- [3] HIGH-RATE RF SPUTTERING SYSTEM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1970, 7 (02): : 343 - &
- [4] LAMONT LT, 1972, NASASP5111
- [5] ROCK FC, 1963, J VAC SCI TECHNOL, V12, P219
- [6] WEISENFELDT CH, 1967, PHILIPS RES REPT S2