THERMAL CHEMICAL-VAPOR-DEPOSITION OF SEMICONDUCTORS FOR THIN-FILM-TRANSISTOR APPLICATIONS

Formation of the semiconducting layer is a crucial part of the fabrication of thin film transistors for flat panel display applications. Despite severe constraints on maximum process temperatures, control of grain size and surface roughness is essential in order to achieve good transistor characteristics. This paper reviews the various approaches which have been explored for deposition of the semiconducting thin films. I will show that the transistor characteristics are strongly influenced by nucleation processes in the bulk of the films and at the interfaces. Control of these nucleation processes will be best achieved by integrated processing where multiple layers are grown without exposure to contaminants.