SUPERCONDUCTIVITY OF NIOBIUM THIN FILMS DEPOSITED BY DC DIODE SPUTTERING

被引：20

作者：

SOSNIAK, J

HULL, GW

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1967年 / 38卷 / 11期

关键词：

D O I：

10.1063/1.1709136

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4390 / &

共 13 条

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JOURNAL OF APPLIED PHYSICS, 1963, 34 (12) :3541-&

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HALL, PM .

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[5]

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[6]

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THEUERER, HC .

PHYSICAL REVIEW A-GENERAL PHYSICS, 1964, 134 (1A) :A198-&

[8] SUPERCONDUCTIVITY AND STRUCTURE OF HYDRIDES AND NITRIDES OF TANTALUM AND COLUMBIUM [J].

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[9] VAPOR-DEPOSITED SUPERCONDUCTIVE FILMS OF NB, TA, + V [J].

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EKVALL, RA .

JOURNAL OF APPLIED PHYSICS, 1964, 35 (3P1) :547-&

[10] EFFECT OF BACKGROUND-GAS IMPURITIES ON FORMATION OF SPUTTERED BETA-TANTALUM FILMS [J].

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POLITO, WJ ;

ROZGONYI, GA .

JOURNAL OF APPLIED PHYSICS, 1967, 38 (08) :3041-&

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