EFFECT OF BACKGROUND-GAS IMPURITIES ON FORMATION OF SPUTTERED BETA-TANTALUM FILMS

被引：25

作者：

SOSNIAK, J

POLITO, WJ

ROZGONYI, GA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1967年 / 38卷 / 08期

关键词：

D O I：

10.1063/1.1710059

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：3041 / &

相关论文

共 15 条

[1] GULDNER WG, 1964 P EL COMP C WAS
[2] CONTAMINATION IN ULTRA-HIGH VACUUM PLANT
HOLLAND, L
PRIESTLAND, C
LAURENSON, L
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1963, 34 (04) : 377 - +
[3] HOLLAND L, 1963, VACUUM, V13, P173
[4] LANGE WJ, 13 NAT VAC S AVS ED
[5] TANTALUM-FILM TECHNOLOGY
MCLEAN, DA
SCHWARTZ, N
TIDD, ED
[J]. PROCEEDINGS OF THE IEEE, 1964, 52 (12) : 1450 - &
[6] IONIC CONDUCTIVITY DIELECTRIC CONSTANT AND OPTICAL PROPERTIES OF ANODIC OXIDE FILMS ON 2 TYPES OF SPUTTERED TANTALUM FILMS
MILLS, D
YOUNG, L
ZOBEL, FGR
[J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (04) : 1821 - &
[7] A NEW STRUCTURE IN TANTALUM THIN FILMS (VAPOR DEPOSITION SUPERCONDUCTIVITY SPUTTERING X-RAY DIFFRACTION E)
READ, MH
ALTMAN, C
[J]. APPLIED PHYSICS LETTERS, 1965, 7 (03) : 51 - &
[8] ULTRAHIGH VACUUM STATION FOR THIN FILM AND RESIDUAL GAS ANALYSIS STUDIES
ROZGONYI, GA
POLITO, WJ
SCHWARTZ, B
[J]. VACUUM, 1966, 16 (03) : 121 - &
[9] INCREASE OF RESIDUAL BACKGROUND GASES DURING ULTRAHIGH-VACUUM MASS SPECTROSCOPIC ANALYSIS
ROZGONYI, GA
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1966, 3 (04): : 187 - &
[10] ROZGONYI GA, UNPUBLISHED DATA