DETECTION OF GROUND-STATE ATOMIC-HYDROGEN IN A DC-PLASMA USING 3RD-HARMONIC GENERATION

被引:26
作者
CELII, FG
THORSHEIM, HR
BUTLER, JE
PLANO, LS
PINNEO, JM
机构
[1] USN,RES LAB,DIV CHEM,WASHINGTON,DC 20375
[2] CRYSTALLUME INC,MENLO PK,CA 94025
关键词
D O I
10.1063/1.346263
中图分类号
O59 [应用物理学];
学科分类号
摘要
Third-harmonic generation (THG) was used to monitor ground-state atomic hydrogen H(1s 2S1/2) in a dc plasma system. A 364.6 nm laser beam focused through H2 or CH 4/H2 plasmas induced THG at 121.5 nm, near the atomic hydrogen 2p 2PoJ→1s 2S 1/2 Lyman-α transition. Both the intensity and frequency shift of the excitation spectra exhibited dependence on the plasma power. Absolute H atom concentration was estimated by comparing the frequency shift to that obtained in a calibrated microwave discharge flow system. The sensitivity was ∼4×1013 cm-3 (100 ppm). The measured atomic hydrogen densities were substantially less than in other diamond chemical vapor deposition methods and may explain the lower diamond deposition rates obtained with dc plasma systems of this type.
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收藏
页码:3814 / 3817
页数:4
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