SUPERCONDUCTING PROPERTIES OF VANADIUM FILMS

被引：14

作者：

ALEKSEEVSKII, NE

SAKOSARENKO, VM

BLUTHNER, K

KOHLER, HJ

机构：

[1] FRIEDRICH SCHILLER UNIV, SEKT PHYS, JENA, GERMANY

[2] ACAD SCI USSR, INST PHYS PROBLEMS, MOSCOW, USSR

来源：

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 1976年 / 34卷 / 02期

关键词：

D O I：

10.1002/pssa.2210340216

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：541 / 546

页数：6

共 12 条

[1]

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[2]

ALEKSEEWSKII NE, 1974, FIZ KHIM OBRAB MATER, V6, P140

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TINKHAM, M .

PHYSICAL REVIEW, 1968, 172 (02) :441-+

[4]

HUDSON WR, 1971, TND6380 NASA REP

[5]

KESSEL W, 1969, PTB3 MITT

[6] KINETICS OF SILICIDE FORMATION BY THIN-FILMS OF V ON SI AND SIO2 SUBSTRATES [J].

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NICOLET, MA ;

MAYER, JW .

JOURNAL OF APPLIED PHYSICS, 1974, 45 (08) :3304-3308

[7] ELECTRICAL CHARACTERISTICS OF RF-SPUTTERED SINGLE-CRYSTAL NIOBIUM FILMS [J].

MAYADAS, AF ;

LAIBOWITZ, RB ;

CUOMO, JJ .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (03) :1287-+

[8]

RADEBANCK R, 1966, PHYS REV, V149, P219

[9] LOW-TEMPERATURE THERMODYNAMIC PROPERTIES OF VANADIUM .I. SUPERCONDUCTING AND NORMAL STATES [J].

RADEBAUGH, R ;

KEESOM, PH .

PHYSICAL REVIEW, 1966, 149 (01) :209-+

[10]

Saint-James D., 1969, TYPE 2 SUPERCONDUCTI

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