THERMAL-STABILITY OF SOFT-X-RAY MO-SI AND MOSI2-SI MULTILAYER MIRRORS

被引：61

作者：

KONDRATENKO, VV ^{[1
]}

PERSHIN, YP ^{[1
]}

POLTSEVA, OV ^{[1
]}

FEDORENKO, AI ^{[1
]}

ZUBAREV, EN ^{[1
]}

YULIN, SA ^{[1
]}

KOZHEVNIKOV, IV ^{[1
]}

SAGITOV, SI ^{[1
]}

CHIRKOV, VA ^{[1
]}

LEVASHOV, VE ^{[1
]}

VINOGRADOV, AV ^{[1
]}

机构：

[1] PN LEBEDEV PHYS INST, MOSCOW, RUSSIA

来源：

APPLIED OPTICS | 1993年 / 32卷 / 10期

关键词：

X-RAY; MULTILAYER; THERMAL STABILITY;

D O I：

10.1364/AO.32.001811

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The thermal stability of Mo-Si multilayers prepared by magnetron sputtering is studied. It is found that degradation of x-ray reflectivity of Mo-Si multilayers under heat loading is connected with the roughening of Mo-Si interfaces and the formation of compounds Mo(x)Si(y). To avoid these degradation mechanisms we fabricated and tested MoSi2-Si multilayers under heat loading. The MoSi2-Si multilayer appeared to be much more stable both in period and x-ray reflectivity because of thermodynamic equilibrium of the components MoSi2 and Si at the interface. The working temperature of MoSi2-Si multilayers reaches 1000 K.

引用

页码：1811 / 1816

页数：6

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