2-PHASE STRUCTURE OF A-SI1-XNX-H FABRICATED BY MICROWAVE GLOW-DISCHARGE TECHNIQUE

被引：25

作者：

CHAYAHARA, A

UEDA, M

HAMASAKI, T

OSAKA, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1985年 / 24卷 / 01期

关键词：

D O I：

10.1143/JJAP.24.19

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：19 / 23

页数：5

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