MAGNETOSTRICTION OF SPUTTERED SM-FE THIN-FILMS

被引:27
作者
HONDA, T [1 ]
HAYASHI, Y [1 ]
ARAI, KI [1 ]
ISHIYAMA, K [1 ]
YAMAGUCHI, M [1 ]
机构
[1] TOHOKU UNIV,ELECT COMMUN RES INST,SENDAI,MIYAGI 980,JAPAN
关键词
D O I
10.1109/20.280878
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The magnetostriction and the magnetic properties of amorphous SmxFe100-x thin films prepared by sputtering were investigated at room temperature. The magnetostriction, -lambda, of these films increased rapidly in low fields (<1kOe) and reached the maximum values of 300-400x10(-6) at 16kOe for x=30-40. These results suggest that Sm-Fe thin films could be used for micro-actuators. The magnetic properties of Sm-Fe thin films did not show clear dependence on the sputtering conditions such as input power, Ar gas pressure, and substrate temperature.
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收藏
页码:3126 / 3131
页数:6
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