REDUCTION OF SURFACE-STATES ON GAAS BY THE PLASMA GROWTH OF OXYFLUORIDES

被引:14
作者
AHRENKIEL, RK [1 ]
KAZMERSKI, LL [1 ]
IRELAND, PJ [1 ]
JAMJOUM, O [1 ]
RUSSELL, PE [1 ]
DUNLAVY, D [1 ]
WAGNER, RS [1 ]
PATTILLO, S [1 ]
JERVIS, T [1 ]
机构
[1] UNIV CALIF LOS ALAMOS NATL LAB,LOS ALAMOS,NM 87545
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 21卷 / 02期
关键词
D O I
10.1116/1.571672
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:434 / 437
页数:4
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