X-RAY-LITHOGRAPHY BEAM LINE BL-17C AT THE PHOTON FACTORY

被引：2

作者：

TAGUCHI, T

GOTOH, S

OKAMURA, S

HISATSUGU, T

机构：

[1] Fujitsu Laboratories Ltd., Atsugi, 243-01

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 1990年 / 291卷 / 1-2期

关键词：

D O I：

10.1016/0168-9002(90)90055-B

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We constructed a beam line, BL-17C, for X-ray lithography at the Photon Factory. In this beam line, two parallel mirrors are used to cutoff high-energy photons and to keep the light path of the reflected beam unchanged when the glancing angle of the mirrors changes. We studied the reflective characteristics of mirrors using He gas scattering to measure reflected and incident light spectra. The obtained reflectivity for a fused quartz mirror with a roughness of 0.3 nm nearly equaled the theoretical value. © 1990.

引用

页码：176 / 178

页数：3

共 4 条

[1] RELATION BETWEEN SURFACE ROUGHNESS AND SPECULAR REFLECTANCE AT NORMAL INCIDENCE [J].