共 13 条
- [1] FABRICATION OF 50 NM LINE-AND-SPACE X-RAY MASKS IN THICK AU USING A 50 KEV ELECTRON-BEAM SYSTEM [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1992, 10 (01): : 118 - 121
- [2] HU H, 1994, 1994 SYMPOSIUM ON VLSI TECHNOLOGY, P17
- [3] KERN W, 1970, RCA REV, V31, P187
- [4] LEE K, 1993, ROOM TEMPERATURE 0 1, P131
- [5] A COMPACT, LOW-COST SYSTEM FOR SUB-100 NM X-RAY-LITHOGRAPHY [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (06): : 1648 - 1651
- [6] NOVEL ON-AXIS INTERFEROMETRIC ALIGNMENT METHOD WITH SUB-10-NM PRECISION [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2191 - 2194
- [7] FABRICATION AND CHARACTERIZATION OF HIGH-FLATNESS MESA-ETCHED SILICON-NITRIDE X-RAY MASKS [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06): : 3287 - 3291
- [9] SU L, 1993, OPTIMIZATION SERIES, P723
- [10] TAUR Y, 1993, HIGH PERFORMANCE O 1, P127