GROWTH OF LOW DISLOCATION DENSITY GAAS BY AS PRESSURE-CONTROLLED CZOCHRALSKI METHOD

被引:28
作者
TOMIZAWA, K [1 ]
SASSA, K [1 ]
SHIMANUKI, Y [1 ]
NISHIZAWA, J [1 ]
机构
[1] RES DEV CORP JAPAN,SEMICOND RES INST,NISHIZAWA PERFECT CRYSTAL PROJECT,SENDAI,JAPAN
关键词
D O I
10.1149/1.2115264
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
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收藏
页码:2394 / 2397
页数:4
相关论文
共 12 条
[1]   DISLOCATION STUDIES IN 3-INCH DIAMETER LIQUID ENCAPSULATED CZOCHRALSKI GAAS [J].
CHEN, RT ;
HOLMES, DE .
JOURNAL OF CRYSTAL GROWTH, 1983, 61 (01) :111-124
[2]  
FRIEDEL J, 1964, DISLOCATIONS, P92
[3]   A THERMOELASTIC ANALYSIS OF DISLOCATION GENERATION IN PULLED GAAS CRYSTALS [J].
JORDAN, AS ;
CARUSO, R ;
VONNEIDA, AR .
BELL SYSTEM TECHNICAL JOURNAL, 1980, 59 (04) :593-637
[4]   LIQUID SEAL CZOCHRALSKI GROWTH OF GALLIUM-ARSENIDE [J].
LEUNG, PC ;
ALLRED, WP .
JOURNAL OF CRYSTAL GROWTH, 1973, 19 (04) :356-358
[5]   INHOMOGENEOUS GAAS-FET THRESHOLD VOLTAGES RELATED TO DISLOCATION DISTRIBUTION [J].
NANISHI, Y ;
ISHIDA, S ;
HONDA, T ;
YAMAZAKI, H ;
MIYAZAWA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (06) :L335-L337
[6]   NEARLY PERFECT CRYSTAL-GROWTH OF III-V COMPOUNDS BY TEMPERATURE DIFFERENCE METHOD UNDER CONTROLLED VAPOR-PRESSURE [J].
NISHIZAWA, J ;
OKUNO, Y ;
TADANO, H .
JOURNAL OF CRYSTAL GROWTH, 1975, 31 (DEC) :215-222
[7]  
NISHIZAWA J, 1981, 3RD P INT SCH SEM OP
[8]  
NISHIZAWA J, 1978, 2ND P INT SCH SEM OP
[9]  
PARSEY JM, 1983, MAY EL SOC M SAN FRA
[10]   DEFECT STRUCTURE INTRODUCED DURING OPERATION OF HETEROJUNCTION GAAS LASERS [J].
PETROFF, P ;
HARTMAN, RL .
APPLIED PHYSICS LETTERS, 1973, 23 (08) :469-471