HOLOGRAPHIC PHOTOELECTROCHEMICAL ETCHING OF DIFFRACTION GRATINGS IN N-INP AND N-GALNASP FOR DISTRIBUTED FEEDBACK LASERS

被引：37

作者：

LUM, RM

GLASS, AM

OSTERMAYER, FW

KOHL, PA

BALLMAN, AA

LOGAN, RA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 01期

关键词：

D O I：

10.1063/1.335392

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：39 / 44

页数：6

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