RADIATION-INDUCED ACID GENERATION REACTIONS IN CHEMICALLY AMPLIFIED RESISTS FOR ELECTRON-BEAM AND X-RAY-LITHOGRAPHY

被引：240

作者：

KOZAWA, T ^{[1
]}

YOSHIDA, Y ^{[1
]}

UESAKA, M ^{[1
]}

TAGAWA, S ^{[1
]}

机构：

[1] UNIV TOKYO,NUCL SCI & TECHNOL RES CTR,TOKAI,IBARAKI 31911,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1992年 / 31卷 / 12B期

关键词：

CHEMICALLY AMPLIFIED RESIST; ONIUM SALT; M-CRESOL; PROTONATION; PROTON ADDUCT; PULSE RADIOLYSIS;

D O I：

10.1143/JJAP.31.4301

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The radiation-induced reactions of onium salts in some kinds of solutions and model compound solutions of chemically amplified electron beam (EB) and X-ray resists have been studied by means of picosecond and nanosecond pulse radiolysis. The following reaction mechanisms of the chemically amplified EB and X-ray resists have been elucidated. The radiation-induced reaction mechanisms are complicated due to the presence of several proton donors. The onium salts directly produce small amounts of Bronsted acids by EB and X-ray exposure and most of the Bronsted acids are formed from proton adducts of the base polymer. The onium salts are strong electron scavengers and promote the generation of the proton adducts in the chemically amplified resists.

引用

页码：4301 / 4306

页数：6

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