STRUCTURE OF REACTIVELY MAGNETRON SPUTTERED HF-N FILMS

[1] SOME PROPERTIES OF RF-SPUTTERED HAFNIUM NITRIDE COATINGS [J]. THIN SOLID FILMS, 1982, 96 (01) : 87 - 91

[2] Hoffman R. W., 1966, PHYS THIN FILMS, VVol. 3, pp. 211

[3] HIGH-RATE DEPOSITION OF HAFNIUM NITRIDE BY ACTIVATED REACTIVE EVAPORATION (ARE) [J]. THIN SOLID FILMS, 1979, 63 (02) : 327 - 331

[4] UNTERSUCHUNGEN IN DEN SYSTEMEN - HAFNIUM-BOR-STICKSTOFF UND ZIRKONIUM-BOR-STICKSTOFF [J]. MONATSHEFTE FUR CHEMIE, 1961, 92 (02): : 415 - &

[5] CRYSTAL STRUCTURES OF HF3N2 AND HF4N3 [J]. METALLURGICAL TRANSACTIONS, 1970, 1 (05): : 1249 - &

[6] STRUCTURE AND ELECTRICAL PROPERTIES OF SPUTTERED FILMS OF HAFNIUM AND HAFNIUM COMPOUNDS [J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (10) : 4227 - &

[7] MECHANISMS OF REACTIVE SPUTTERING OF TITANIUM NITRIDE AND TITANIUM CARBIDE .2. MORPHOLOGY AND STRUCTURE [J]. THIN SOLID FILMS, 1983, 105 (04) : 367 - 384

[8] Toth L.E, 1971, TRANSITION METAL CAR

[1] SOME PROPERTIES OF RF-SPUTTERED HAFNIUM NITRIDE COATINGS [J]. THIN SOLID FILMS, 1982, 96 (01) : 87 - 91

[2] Hoffman R. W., 1966, PHYS THIN FILMS, VVol. 3, pp. 211

[3] HIGH-RATE DEPOSITION OF HAFNIUM NITRIDE BY ACTIVATED REACTIVE EVAPORATION (ARE) [J]. THIN SOLID FILMS, 1979, 63 (02) : 327 - 331

[4] UNTERSUCHUNGEN IN DEN SYSTEMEN - HAFNIUM-BOR-STICKSTOFF UND ZIRKONIUM-BOR-STICKSTOFF [J]. MONATSHEFTE FUR CHEMIE, 1961, 92 (02): : 415 - &

[5] CRYSTAL STRUCTURES OF HF3N2 AND HF4N3 [J]. METALLURGICAL TRANSACTIONS, 1970, 1 (05): : 1249 - &

[6] STRUCTURE AND ELECTRICAL PROPERTIES OF SPUTTERED FILMS OF HAFNIUM AND HAFNIUM COMPOUNDS [J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (10) : 4227 - &

[7] MECHANISMS OF REACTIVE SPUTTERING OF TITANIUM NITRIDE AND TITANIUM CARBIDE .2. MORPHOLOGY AND STRUCTURE [J]. THIN SOLID FILMS, 1983, 105 (04) : 367 - 384

[8] Toth L.E, 1971, TRANSITION METAL CAR