ELECTROCHEMICAL STUDY OF HYPOPHOSPHITE-REDUCED ELECTROLESS COPPER DEPOSITION

被引:20
作者
HUNG, A [1 ]
OHNO, I [1 ]
机构
[1] TOKYO INST TECHNOL,DEPT MET ENGN,MEGURO KU,TOKYO 152,JAPAN
关键词
D O I
10.1149/1.2086579
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The hypophosphite-reduced electroless copper deposition was studied by partial anodic and partial cathodic polarization curves at various pH and various concentrations of metal ions and reducing agents. For comparison, the complete bath polarization curves were also studied. Although the reaction of hypophosphite-reduced system is very complicated, it still follows the mixed potential theory. © 1990, The Electrochemical Society, Inc. All rights reserved.
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收藏
页码:918 / 921
页数:4
相关论文
共 12 条
[1]  
HUNG A, 1988, PLAT SURF FINISH, V75, P74
[2]  
HUNG A, 1988, PLAT SURF FINISH, V75, P62
[3]  
HUNG A, 1989, J ELECTROCHEM SOC, V136, P72
[4]  
KUKANSKI PE, 1980, Patent No. 4209331
[5]   MEASUREMENT OF THE INSTANTANEOUS RATE OF ELECTROLESS PLATING BY AN ELECTROCHEMICAL METHOD [J].
OHNO, I ;
HARUYAMA, S .
SURFACE TECHNOLOGY, 1981, 13 (01) :1-15
[6]   ANODIC-OXIDATION OF REDUCTANTS IN ELECTROLESS PLATING [J].
OHNO, I ;
WAKABAYASHI, O ;
HARUYAMA, S .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (10) :2323-2330
[7]  
Ohno I., 1979, J MET FINISH SOC JPN, V30, P289
[8]  
OHNO I, UNPUB PLAT SURF FIN
[9]  
OHNO I, 1978, J MET FINISH SOC JPN, V29, P600
[10]   ELECTROCHEMICAL STUDY OF ELECTROLESS GOLD-DEPOSITION REACTION [J].
OKINAKA, Y .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (06) :739-744