ANODIC-OXIDATION OF REDUCTANTS IN ELECTROLESS PLATING

被引：228

作者：

OHNO, I ^{[1
]}

WAKABAYASHI, O ^{[1
]}

HARUYAMA, S ^{[1
]}

机构：

[1] TOKYO INST TECHNOL,FAC ENGN,MEGURO KU,TOKYO 152,JAPAN

来源：

关键词：

D O I：

10.1149/1.2113572

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2323 / 2330

页数：8

共 38 条

[1] BRENNER A, 1946, J RES NBS, V37, P1
[2] De Minjer C H, 1975, ELECTRODEPOSITION SU, V3, P261, DOI [10.1016/0300-9416(75)90004-8, DOI 10.1016/0300-9416(75)90004-8]
[3] Dini J. W., 1967, PLATING, V54, P385
[4] Donahue F. M., 1972, OBERFLACHE SURFACE, V13, P301
[5] RATE OF ELECTROLESS COPPER DEPOSITION BY FORMALDEHYDE REDUCTION
DUMESIC, J
KOUTSKY, JA
CHAPMAN, TW
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (11) : 1405 - 1412
[6] ANODIC BEHAVIOUR OF BOROHYDRIDE ION
ELDER, JP
HICKLING, A
[J]. TRANSACTIONS OF THE FARADAY SOCIETY, 1962, 58 (477): : 1852 - &
[7] GAVALLOTTI PL, 1968, ELECTROCHIM MET, V3, P239
[8] ELECTROLESS DEPOSITION OF NICKEL-BORON ALLOYS - MECHANISM OF PROCESS, STRUCTURE, AND SOME PROPERTIES OF DEPOSITS
GORBUNOVA, KM
IVANOV, MV
MOISEEV, VP
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (05) : 613 - 618
[9] GORBUNOVA KM, 1970, PROT MET, V6, P470
[10] Gutzeit G., 1959, PLATING, V46, P1158