NEUTRON-INDUCED TRAPPING LEVELS IN ALUMINUM GALLIUM-ARSENIDE

被引:21
作者
BARNES, CE
ZIPPERIAN, TE
DAWSON, LR
机构
[1] Sandia Natl Lab, Albuquerque, NM,, USA, Sandia Natl Lab, Albuquerque, NM, USA
关键词
SEMICONDUCTOR DEVICES - Junctions - SEMICONDUCTOR DIODES; LIGHT EMITTING - SPECTROSCOPY; ELECTRON;
D O I
10.1007/BF02656670
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Deep level transient spectroscopy (DLTS) measurements have been performed on a variety of Al//xGa//1// minus //xAs p-n junctions prior to and following a series of fast neutron irradiations at room temperature and subsequent isochronal anneals. In contrast with electron and proton irradiated GaAs, neutron irradiation produces a single, broad featureless DLTS band which is a majority carrier trap in both n and p type material. The characteristics of this neutron-induced trap are relatively independent of growth method, dopant type and concentration.
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页码:95 / 118
页数:24
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