CHARACTERISTIC CHANGE DUE TO ARGON ION ETCHING AND HEAT-TREATMENT OF (PB,LA)TIO3 THIN-FILMS FABRICATED BY MULTIPLE CATHODE SPUTTERING

被引：9

作者：

MAIWA, H ^{[1
]}

ICHINOSE, N ^{[1
]}

OKAZAKI, K ^{[1
]}

机构：

[1] WASEDA UNIV,SCH SCI & ENGN,DEPT MAT SCI & ENGN,SHINJUKU KU,TOKYO 169,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1995年 / 34卷 / 9B期

关键词：

FERROELECTRIC THIN FILMS; NVRAM; MULTIPLE CATHODE SPUTTERING; (PB; LA)TIO3; ARGON ION ETCHING; HEAT TREATMENT DEFECT; XPS; RTA;

D O I：

10.1143/JJAP.34.5136

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The ferroelectric properties of (Pb, La)TiO3 thin films fabricated by multiple cathode rf-magnetron sputtering were investigated. After argon ion etching of the (Pb, La)TiO3 thin films, the reduction of Pb-O bonds, shift of hysteresis loop on the E-axis and the decrease of remanent polarization was induced. After heat treatment at 700 degrees C in N-2, squareness and saturation of the loop worsened and remanent polarization decreased. After reheat treatment of the films at 400 degrees C for 1 h, the coercive field decreased, and the squareness of the loop was improved. These results were discussed from the viewpoint of the behavior of space charge.

引用

页码：5136 / 5140

页数：5

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