SURFACE-REACTIONS OF DIMETHYLAMINOARSINE DURING MOMBE OF GAAS

被引:53
作者
SALIM, S
LU, JP
JENSEN, KF
BOHLING, DA
机构
[1] MIT,DEPT MAT SCI & ENGN,CAMBRIDGE,MA 02139
[2] AIR PROD & CHEM,ALLENTOWN,PA 18195
基金
美国国家科学基金会;
关键词
D O I
10.1016/0022-0248(92)90431-H
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We present in-situ mass spectroscopy studies of surface reactions of dimethylaminoarsine and tertiarybutylarsine under metalorganic molecular beam epitaxy conditions. The results show that the thermal decomposition of dimethylaminoarsine is completed at 450-degrees-C with the major products being dimethylamine, hydrogen, aziridine and N-methylmethyleneimine. In contrast, tertiarybutylarsine is not fully decomposed even at 550-degrees-C. Co-dosing experiments with trimethylgallium and deuterium labeled trimethylgallium (Ga(CD3)3) show methane and methylarsenic to be major reaction products in addition to nitrogen containing species, specifically aziridine, methylmethyleneimine and dimethylamine. No trimethylamine is detected as a surface reaction product. The generation of methane and methylarsenic from the surface is proposed as a possible mechanism for the reduced carbon incorporation reported for molecular beam epitaxy growth of GaAs with dimethylaminoarsine.
引用
收藏
页码:16 / 22
页数:7
相关论文
共 24 条
[1]   GROWTH OF GAAS AND ALGAAS BY METALORGANIC MOLECULAR-BEAM EPITAXY USING TRIS-DIMETHYLAMINOARSENIC [J].
ABERNATHY, CR ;
WISK, PW ;
BOHLING, DA ;
MUHR, GT .
APPLIED PHYSICS LETTERS, 1992, 60 (19) :2421-2423
[2]  
ANNAPRAGADA AV, 1991, MATER RES SOC SYMP P, V204, P53
[3]   PYROLYTIC PRODUCTION AND MICROWAVE-SPECTRA OF LIGHT AND HEAVY N-METHYLMETHYLENIMINE [J].
BAK, B ;
LARSEN, NW ;
SVANHOLT, H .
ACTA CHEMICA SCANDINAVICA SERIES A-PHYSICAL AND INORGANIC CHEMISTRY, 1977, 31 (09) :755-758
[4]   ALTERNATIVE PRECURSORS FOR III-V MOVPE CRITERIA FOR EVALUATION [J].
BRAUERS, A .
JOURNAL OF CRYSTAL GROWTH, 1991, 107 (1-4) :281-289
[5]   PYROLYSIS OF TRIMETHYL HEXAHYDRO-S-TRIAZINES - PHOTOELECTRON-SPECTRA OF N-METHYLMETHYLENIMINE, CH2=NCH3, AND C-METHYLMETHYLENIMINE, CH3CH=NH [J].
FROST, DC ;
MACDONALD, B ;
MCDOWELL, CA ;
WESTWOOD, NPC .
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1978, 14 (05) :379-390
[6]   METALORGANIC CHEMICAL VAPOR-DEPOSITION OF HIGH-PURITY GAAS USING TERTIARYBUTYLARSINE [J].
HAACKE, G ;
WATKINS, SP ;
BURKHARD, H .
APPLIED PHYSICS LETTERS, 1989, 54 (20) :2029-2031
[7]   MASS-SPECTROMETRIC STUDY AND MODELING OF DECOMPOSITION PROCESS OF TRIS-DIMETHYLAMINO-ARSENIC ON (001) GAAS SURFACE [J].
HAMAOKA, K ;
SUEMUNE, I ;
FUJII, K ;
KOUI, T ;
KISHIMOTO, A ;
YAMANISHI, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1991, 30 (9A) :L1579-L1582
[8]  
HELLER SR, 1978, EPA NIH MASS SPECTRA, V1
[9]   USE OF TERTIARY-BUTYLARSINE IN THE FABRICATION OF GAAS/ALGAAS QUANTUM-WELLS AND QUANTUM-WELL LASERS [J].
HUMMEL, SG ;
BEYLER, CA ;
ZOU, Y ;
GRODZINSKI, P ;
DAPKUS, PD .
APPLIED PHYSICS LETTERS, 1990, 57 (07) :695-697
[10]   THE GROWTH OF GAAS, ALGAAS, AND SELECTIVELY DOPED ALGAAS/GAAS HETEROSTRUCTURES BY METALORGANIC VAPOR-PHASE EPITAXY USING TERTIARY-BUTYLARSINE [J].
KIKKAWA, T ;
TANAKA, H ;
KOMENO, J .
JOURNAL OF APPLIED PHYSICS, 1990, 67 (12) :7576-7582