NEAR-FIELD MEASUREMENTS OF OPTICAL CHANNEL WAVE-GUIDES AND DIRECTIONAL-COUPLERS

被引：65

作者：

CHOO, AG ^{[1
]}

JACKSON, HE ^{[1
]}

THIEL, U ^{[1
]}

DEBRABANDER, GN ^{[1
]}

BOYD, JT ^{[1
]}

机构：

[1] UNIV CINCINNATI,DEPT ELECT & COMP ENGN,CINCINNATI,OH 45221

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 08期

关键词：

Curve fitting - Guided electromagnetic wave propagation - Interfaces (materials) - Mathematical models - Microscopic examination - Optical resolving power - Optical waveguides - Refractive index - Silicon nitride - Three dimensional - Waveguide couplers;

D O I：

10.1063/1.112157

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Near field microscopy is used to investigated the guided moded intensity distribution of optical channel waveguides and directional couplers with subwavelength spatial resolution. The directional coupler consisted of two single mode optical ridge channel waveguides formed with silicon nitride deposited on a lower cladding layer of SiO2 on a silicon substrate. A near field measurement of the guided mode intensity profile in the transverse direction parallel to the waveguide surface was performed across one of the optical channel waveguides. These variations are compared with model calculations. Similar transverse measurements of light propagating through a directional coupler were performed at many locations along the coupler, providing a view of the evolution of optical power transfer.

引用

页码：947 / 949

页数：3

共 9 条

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