IMPLANTATION OF CARBON INTO THIN IRON FILMS

[1] IMPLANTATION PROFILES FOR 40KEV PHOSPHORUS IONS IN SILICON SINGLE-CRYSTAL SUBSTRATES (TEMPERATURE DEPENDENCE CHANNELING E/T) [J]. APPLIED PHYSICS LETTERS, 1966, 8 (02) : 46 - +

[2] NATURE OF CHI-CARBIDE AND ITS POSSIBLE OCCURRENCE IN STEELS [J]. NATURE, 1966, 212 (5059) : 248 - &

[3] Lindhard J, 1965, K DAN VIDENSK SELSK, V34

[4] Lindhard J., 1963, MAT FYS MEDD K DAN V, V33, P31

[5] Mayer J. W., 1970, ION IMPLANTATION SEM

[6] RUHL RC, 1969, T METALL SOC AIME, V245, P240

[7] SCHIOTT HE, 1966, MAT FYS MEDD DAN VID, V35

[1] IMPLANTATION PROFILES FOR 40KEV PHOSPHORUS IONS IN SILICON SINGLE-CRYSTAL SUBSTRATES (TEMPERATURE DEPENDENCE CHANNELING E/T) [J]. APPLIED PHYSICS LETTERS, 1966, 8 (02) : 46 - +

[2] NATURE OF CHI-CARBIDE AND ITS POSSIBLE OCCURRENCE IN STEELS [J]. NATURE, 1966, 212 (5059) : 248 - &

[3] Lindhard J, 1965, K DAN VIDENSK SELSK, V34

[4] Lindhard J., 1963, MAT FYS MEDD K DAN V, V33, P31

[5] Mayer J. W., 1970, ION IMPLANTATION SEM

[6] RUHL RC, 1969, T METALL SOC AIME, V245, P240

[7] SCHIOTT HE, 1966, MAT FYS MEDD DAN VID, V35