Near-field direct-write ultraviolet lithography and shear force microscopic studies of the lithographic process

被引：95

作者：

Smolyaninov, II

Mazzoni, DL

Davis, CC

机构：

[1] Electrical Engineering Department, University of Maryland, College Park

来源：

APPLIED PHYSICS LETTERS | 1995年 / 67卷 / 26期

关键词：

D O I：

10.1063/1.115297

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Direct-write lithography on a 100 nm scale has been carried out using the near-field optical interaction between an uncoated tapered fiber tip and a layer of photoresist. This allows both lithography and shear force microscopic examination of the surface, which reveals morphological changes in the photoresist before development. (C) 1995 American Institute of Physics.

引用

页码：3859 / 3861

页数：3

共 7 条

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