CHARACTERISTICS OF WN/GAAS SCHOTTKY CONTACTS FORMED BY REACTIVE RF SPUTTERING

被引:39
作者
YAMAGISHI, H
机构
[1] Toshiba Corp, Komukai Works,, Kawasaki, Jpn, Toshiba Corp, Komukai Works, Kawasaki, Jpn
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 12期
关键词
D O I
10.1143/JJAP.23.L895
中图分类号
O59 [应用物理学];
学科分类号
摘要
TRANSISTORS, FIELD EFFECT
引用
收藏
页码:L895 / L898
页数:4
相关论文
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    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1982, 21 (06): : L393 - L395
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