SUBSTANTIAL H-ATOM PRODUCTION FROM THE 193 NM PHOTOLYSIS OF TRIETHYLALUMINUM

被引：12

作者：

BRUM, JL

DESHMUKH, S

KOPLITZ, B

机构：

[1] Department of Chemistry, Tulane University, New Orleans

来源：

CHEMICAL PHYSICS LETTERS | 1990年 / 165卷 / 05期

关键词：

D O I：

10.1016/0009-2614(90)85451-H

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The 193 nm irradiation of triethylaluminum (TEA) produces a significant amount of atomic hydrogen. Doppler profiles at Lyman-α (121.6 nm) reveal that the H atoms have little kinetic energy, the mean kinetic energy being ≤ 0.35 eV. These observations are interpreted in the context of possible photodissociation pathways. The most likely route involves a single-photon absorption followed by dissociation to form the ethyl radical, which can further dissociate to produce C2H4 and H. © 1990.

引用

页码：413 / 416

页数：4

共 14 条

[11] LASER MULTIPHOTON IONIZATION SPECTRUM OF ALCH3 RADICALS FORMED BY UV EXCIMER LASER PHOTOLYSIS OF GASEOUS TMA AT 248 NM AND 193 NM
ZHANG, Y
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ZHANG, Y
STUKE, M
[J]. CHEMICAL PHYSICS LETTERS, 1988, 149 (03) : 310 - 315
[14] UV EXCIMER LASER PHOTOCHEMISTRY OF GASEOUS AND SURFACE ADSORBED ORGANOMETALLICS
ZHANG, Y
STUKE, M
[J]. JOURNAL OF CRYSTAL GROWTH, 1988, 93 (1-4) : 143 - 150

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