100 KEV FOCUSED ION-BEAM SYSTEM WITH A EXB MASS FILTER FOR MASKLESS ION-IMPLANTATION

被引：43

作者：

SHIOKAWA, T ^{[1
]}

KIM, PH ^{[1
]}

TOYODA, K ^{[1
]}

NAMBA, S ^{[1
]}

MATSUI, T ^{[1
]}

GAMO, K ^{[1
]}

机构：

[1] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 04期

关键词：

D O I：

10.1116/1.582646

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1117 / 1120

页数：4

共 8 条

[1]

BAN E, 1982, 6TH P S ISIAT KYOT, P121

[2] LIQUID-METAL ALLOY ION SOURCES FOR B, SB, AND SI [J].

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UKEGAWA, T ;

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[3] B, AS AND SI FIELD-ION SOURCES [J].

GAMO, K ;

UKEGAWA, T ;

INOMOTO, Y ;

KA, KK ;

NAMBA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (10) :L595-L598

[4]

ISHITANI T, 1983, UNPUB 6TH P INT C IO

[5]

KNAUER W, 1981, OPTIK, V59, P335

[6] FET FABRICATION USING MASKLESS ION-IMPLANTATION [J].

KUBENA, RL ;

ANDERSON, CL ;

SELIGER, RL ;

JULLENS, RA ;

STEVENS, EH ;

LAGNADO, I .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 19 (04) :916-920

[7] HIGH-INTENSITY SCANNING ION PROBE WITH SUBMICROMETER SPOT SIZE [J].

SELIGER, RL ;

WARD, JW ;

WANG, V ;

KUBENA, RL .

APPLIED PHYSICS LETTERS, 1979, 34 (05) :310-312

[8]

Winterbon K.B., 1975, ION IMPLANTATION RAN, V2

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